Samsung HP3 0.56 µm Gen. Process Flow Analysis

Process flow analysis of the Samsung S5KHP3SP, 1/1.4”, 200 MP, 0.56 μm Pixel Pitch, Back-Illuminated, ISOCELL Tetra2pixel and Super QPD CMOS Image Sensor. The HP3 CIS uses full depth front deep trench isolation (F-DTI) for pixel isolation, Tetra2pixel (4x4 color filter array), and 2x2 OCL for Super Quad Photo Diode (QPD) phase detection autofocus (PDAF).
01Dec

TechInsights for Fabless Semiconductor

TechInsights for Fabless Semiconductor Leverage unrivaled technical insights about the continuous cycle of innovation in the semiconductor market to benchmark chip design against competitors. Platform Member? Sign In Start your free trial Your Fabless Semiconductor Solutions Through TechInsights
30Nov