Etch Smarter: A New Frontier in Sustainable Chip Manufacturing

The incredible precision that allows the semiconductor industry to build chips at the atomic level comes with a hidden cost. Plasma etch, a core process in semiconductor fabrication, is one of the most energy-intensive steps in the entire workflow. Beyond consuming hundreds of kilowatts per tool, these processes rely on powerful greenhouse gases, some with a climate impact tens of thousands of times greater than carbon dioxide.

Our new report, Etch Tools Under the Microscope: Precision, Power, and Planetary Cost, reveals just how significant this challenge is, especially in complex 3D NAND production. But it also highlights the innovative solutions emerging across the industry, from low-GWP gas alternatives and energy-efficient hardware to the use of AI to optimize processes.

This isn't just a technical challenge—it's an industry-wide imperative. The path to greener etch is technically feasible, but it requires the entire ecosystem to align.

To dive deeper into the environmental footprint of processes like high aspect-ratio trenches and to explore the routes the industry can take to improve sustainability while continuing to scale, read the full report.